AIST has developed an ultrasonic flowmeter that can accurately measure micro-flow rates of less than 10 mL/min (error: ±0.1 mL/min) in collaboration with Atsuden and Tokyo Keiso.

In developing the flowmeter, we examined the fundamental theory of ultrasonic wave (guided wave) propagation, increased the frequency of ultrasonic waves, and optimized the design of the ultrasonic flowmeter. This ultrasonic flowmeter can measure flow rates in the micro-flow rate range that has not been possible with conventional ultrasonic flowmeters. It allows highly accurate control of the liquid chemicals used in semiconductor manufacturing equipment and is expected to contribute to the increased performance, reduced environmental load, and reduced running costs of semiconductor manufacturing equipment.