We have developed a new thermal lithography technique that utilizes the thermal decomposition of platinum oxide. This technique enables lithography of high resolution, high speed and wide writing area (96 cm²). The smallest reproduced feature was 50 nm in diameter, using an optical system consisting of a 405 nm laser and an objective lens with numerical aperture (NA) of 0.65. Size of this feature is one eighth of that achievable by conventional photolithographic techniques. High-speed writing of over 6 m/s was achieved, with 3 million nano-dots fabricated per second. With the technique, nano-scale devices will be produced at lowcost.