Two types of new apparatuses for surface micro-fabrication of UV transparent materials, based on AIST-original LIBWE (laser-induced backside wet etching) method, have been developed. One is an excimer laser mask projection system, and another is a diode-pump solid state laser beam scanning system. Both systems can micro-fabricate a silica glass surface of large area rapidly, and high aspect ratio of 60 was attained in a deep trench fabrication. Unlike conventional lithography methods, these apparatuses need no photo-resist, and can be operated under atmospheric pressure. The projection system attained 0.75 µm resolution and the beam scanning system can fabricate prototypes rapidly.