It has been well known that metal hexacarbonyl can be prepared by
chemical vapor deposition to give a range of oxycarbide which shows
high hardness and high anti-corrosive properties.
Recently, instead of the decomposition of metal organic sources by
the chemical vapor deposition, there has been a growing interest in
synthesis by reactive physical vapor deposition because of the operation
without use of metal organic toxic sources. We have synthesized chromium
oxycarbide and molybdenum oxycarbide films from metals and carbon
dioxide without metal hexacarbonyl by the inductively coupled rf plasma
assisted magnetron sputtering method. But cubic tungsten oxycarbide
with high hardness has not been synthesized well by the method. In
order to increase activated molecules of carbon dioxide in the plasma
and to promote the reaction of tungsten atoms with carbon dioxide
in reactive sputtering, a mixture of Ar, He, CO2 and CH4
was used as sputtering gas for the sputtering method, and tungsten
oxycarbide films were synthesized with metal and carbon dioxide by
this method. In near future, the metal oxycarbides are expected to
be used widly as hard coating materials.
|
 |
| Chromium oxycarbide, molybdenum
oxycarbide and tungsten oxycarbide synthesized on stainless
steel substrates (upper side) and aluminum alloy substrates
(lower side) by inductively coupled rf plasma assisted magnetron
sputtering. The micro-Vickers hardness of the films is more
than 21GPa. [The diameter of a coin is 20mm.] |
|
| Relational Information |
|
|
AIST Today Vol. 3, No.2 (2003) 16
|
No.8
Spring 2003
back
> 
