Bragg gratings were printed in Ge-B-SiO2 thin glass films
by KrF excimer laser irradiation through a phase mask. Although the
gratings were almost erased upon annealing at temperatures lower than
500°C, a grating with much high diffraction efficiency was formed
after annealing at 600°C. The diffraction efficiency of the grating
was approximately one order of magnitude greater than that of the
Ge-SiO2 film. The diffraction efficiency of the grating
was unchanged upon repeated heating between room temperature and 600°C.
Thermally stable waveguide wavelength filter could be obtained by
using the thermally stabilized photo-induced Bragg grating.
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Changes in diffraction efficiencies
of the fabricated gratings
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| Relational Information |
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AIST Today Vol. 3, No. 3 (2003) 15
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No.8
Spring 2003
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