We have developed a fabrication process using self-formation of etching
masks with metal clusters as formation nuclei. When Si substrates
deposited with metal clusters are subjected to electron cyclotron
plasma etching with SF6 at around -130oC, reaction
products in the plasma, SxFy, condense preferentially
at the clusters, leading to the self-formation of nanoscale etching
masks. As a result, Si pillars, about 10nm in diameter and 100nm tall,
have been formed with remarkably narrow size-distributions when we
use Au clusters (diameter:1 -3nm). We have also found that Si nanopillars
with a very high aspect ratio (~ 20) can be fabricated by using Fe
clusters.
This process has been easily combined with electron beam lithography
technique, which enables us to define pillar positions. Using this
process, we have fabricated field emitters, 2-dimensional photonic
crystals with waveguides etc.
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The fabrication process
of Si nanopillars
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| Relational Information |
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AIST Today Vol. 3, No. 2 (2003) 10
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No.8
Spring 2003
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