A superimpose technique of RF power and high voltage pulses has been developed for Plasma Based Ion Implantation (PBII). The RF power generates plasma and ions in the plasma are implanted into specimens to modify the surface property. The features of this technique are high power efficiency, uniform distribution of ions over the specimens surface and simplicity of the apparatus. In this stage, nitridation of Ti and Cr and hard carbon coatings were performed using this technique.