CaBi4Ti4O15 thin films were prepared by spin-coating a tailored liquied source as a mixture solution of double alkoxides. As-deposited thin films began crystallization below 550ºC and reached full crystallinity of a single phase of layered-perovskite at 650ºC via rapid thermal annealing in oxygen. 650ºC-annealed CaBi4Ti4O15 thin film showed random orientation on Pt-passivated Si substrate and exhibited P-E hysteresis loops. The remanent polarization (Pr) and coercive electric field (Ec) were 9.4 mC/cm2 and 106 kV/cm, respectively, at 11 V. The polarization did not change after 1011 switching cycles with voltage of 5 V. The dielectric constant and loss factor were 300 and 0.033, respectively, at 100 kHz.
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A cross-sectional TEM photograph of CaBi4Ti4O15 ferroelectric thin film on Pt layer and its stacking structure on Si semiconductor |
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| Relational Information |
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AIST Today Vol. 1, No. 6 (2001) 16
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